Production of a sub-10 fs electron beam with107electrons
نویسندگان
چکیده
منابع مشابه
Limiting factors in sub-10 nm scanning-electron-beam lithography
Achieving the highest possible resolution using scanning-electron-beam lithography SEBL has become an increasingly urgent problem in recent years, as advances in various nanotechnology applications F. S. Bates and G. H. Fredrickson, Annu. Rev. Phys. Chem. 41, 525 1990 ; Black et al., IBM J. Res. Dev. 51, 605 2007 ; Yang et al., J. Chem. Phys. 116, 5892 2002 have driven demand for feature sizes ...
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Ultralow emittance (≤20 nm, normalized) electron beams with 10^{5} electrons per bunch are obtained by tightly focusing an ultrafast (∼100 fs) laser pulse on the cathode of a 1.6 cell radio frequency photoinjector. Taking advantage of the small initial longitudinal emittance, a downstream velocity bunching cavity is used to compress the beam to <10 fs rms bunch length. The measurement is per...
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ژورنال
عنوان ژورنال: Physical Review Special Topics - Accelerators and Beams
سال: 2011
ISSN: 1098-4402
DOI: 10.1103/physrevstab.14.050101